We are glad to welcome Chia Shuo and Akiyoshi Park as our two new graduate students to the Yeh group!
Plasma enhanced chemical vapor deposition (PECVD) techniques have been shown to be an efficient method to achieve single-step synthesis of high-quality monolayer graphene (MLG) without the need of active heating. Here we report PECVD-growth of single-crystalline hexagonal bilayer graphene (BLG) flakes and mm-size BLG films with the interlayer twist angle controlled by the growth parameters. The twist angle has been determined by three experimental approaches, including direct measurement of the relative orientation of crystalline edges between two stacked monolayers by scanning electron microscopy, analysis of the twist angle-dependent Raman spectral characteristics, and measurement of the Moiré period with scanning tunneling microscopy. In mm-sized twisted BLG (tBLG) films, the average twist angle can be controlled from 0° to approximately 20°, and the angular spread for a given growth condition can be limited to < 7°. Different work functions between MLG and BLG have been verified by the Kelvin probe force microscopy and ultraviolet photoelectron spectroscopy. Electrical measurements of back-gated field-effect-transistor devices based on small-angle tBLG samples revealed high-quality electric characteristics at 300 K and insulating temperature dependence down to 100 K. This controlled PECVD-growth of tBLG thus provides an efficient approach to investigate the effect of varying Moiré potentials on tBLG.
Monolayer transition-metal dichalcogenides (TMDCs) in the 2H-phase are semiconductors promising for opto-valleytronic and opto-spintronic applications because of their strong spin-valley coupling. Here we report detailed studies of opto-valleytronic properties of heterogeneous domains in CVD-grown monolayer WS2 single crystals.
Our latest review article by Professor Nai-Chang Yeh, Chen-Chih Hsu, Jacob Bagley and
The realization of many promising technological applications of graphene and graphene-based
nanostructures depends on the availability of reliable, scalable, high-yield and low-cost synthesis
methods. Plasma enhanced chemical vapor deposition (PECVD) has been a versatile technique
for synthesizing many carbon-based materials, because PECVD provides a rich chemical
environment, including a mixture of radicals, molecules and ions from hydrocarbon precursors,
which enables graphene growth on a variety of material surfaces at lower temperatures and faster
growth than typical thermal chemical vapor deposition. Here we review recent advances in the
PECVD techniques for synthesis of various graphene and graphene-based nanostructures.
Pdf Publication Link
The Legacy of ProfessorMildred S. Dresselhaus by Nai-Chang Yeh
Vertically-aligned graphene nanowalls grown via plasma-enhanced chemical vapor deposition as a binder-free cathode in Li–O2 batteries Chih-Pin Han, Vediyappan Veeramani, Chen-Chih Hsu, Anirudha Jena, Ho Chang, Nai-Chang Yeh, Shu-Fen Hu, and Ru-Shi Liu
In the present report, vertically-aligned graphene nanowalls are grown on Ni foam (VA-G/NF) using plasma-enhanced chemical vapor deposition method at room temperature. Optimization of the growth conditions provides graphene sheets with controlled defect sites. The unique architecture of the vertically-aligned graphene sheets allows sufficient space for the ionic movement within the sheets and hence enhancing the catalytic activity. Further modification with ruthenium nanoparticles (Ru NPs) drop-casted on VA-G/NF improves the charge overpotential for lithium–oxygen (Li–O2) battery cycles. Such reduction we believe is due to the easier passage of ions between the perpendicularly standing graphene sheets thereby providing ionic channels.
“High-yield single-step catalytic growth of graphene nano-strips by plasma enhanced chemical vapor deposition”, Chen-Chih Hsu, Jacob D. Bagley, Marcus L. Teague, Wei-Shiuan Tseng, Kathleen L, Yang, Yiran Zhang, Yiliang Li, Yilun Li, James M. Tour, and N.-C. Yeh, Carbon 129, 527 –536 (2018).
“Fractionalized quantum excitations in correlated two-dimensional topological phases”, N.-C. Yeh*, Reviews in Physics 2, 1 (2017), [DOI: 10.1016/j.revip.2017.02.001]
Stabilization of hybrid perovskite CH3NH3PbI3 thin ﬁlms by graphene passivation
Wei-Shiuan Tseng, Meng-Huan Jao, Chen-Chih Hsu, Jing-Shun Huang, Chih-I. Wu and N.-C. Yeh
Hexagonal boron nitride (h-BN) is a promising two-dimensional insulator with a large band gap and low density of charged impurities that is isostructural and isoelectronic with graphene. Here we report the chemical and atomic-scale structure of CVD-grown wafer-scale (~25 cm2) h-BN sheets ranging in thickness from 1-20 monolayers. Atomic-scale images of h-BN on Au and graphene/Au substrates obtained by scanning tunneling microscopy (STM) reveal high h-BN crystalline quality in monolayer samples. Further characterization of 1-20 monolayer samples indicates uniform thickness for wafer-scale areas; this thickness control is a result of precise control of the precursor flow rate, deposition temperature and pressure. Raman and infrared spectroscopy indicate the presence of B-N bonds and reveal a linear dependence of thickness with growth time. X-ray photoelectron spectroscopy (XPS) shows the film stoichiometry, and the B/N atom ratio in our films is 1 ± 0.6% across the range of thicknesses. Electrical current transport in metal/insulator/metal (Au/h-BN/Au) heterostructures indicates that our CVD-grown h-BN films can act as excellent tunnel barriers with a high hard-breakdown field strength. Our results suggest that large-area h-BN films are structurally, chemically and electronically uniform over the wafer scale, opening the door to pervasive application as a dielectric in layered nanoelectronic and nanophotonic heterostructures.